We work with substrates varying from 100mm up to 200mm in diameter including Si, III/V, glass, quartz , SOI; both square and round. We have Flexibility to work with a wide rang of materials, including ‘CMOS-forbidden’ materials, alloys, dielectrics, and polymers like Parylene.
Our main areas of expertise include MEMS (Micro Electro Mechanical Systems), NEMS (Nano Electro Mechanical Systems), microfluidics, quantum dots and nano imprinting lithography.
MEMS inertial sensors
Mir Enterprises designs and manufactures state-of-the-art MEMS inertial sensors with performance amongst the best in their class . These include accelerometers and gyroscopes which measure motion and angular rotation, respectively.
These sensors serve a broad range of industries including: Oil and gas exploration, seismic monitoring, railway technology, autonomous navigation systems, structural monitoring and many more.
Equipped with the latest high-aspect-ratio DRIE process plus lithography resolution down to 0.48um and using our in-house proprietary technology we are able to produce these sensors to a high yield and in a cost effective manner.
We specialise in highly customised MEMS inertial sensors. For further information please get in touch with us.
Microfluidics deals with the behaviour, precise control and manipulation of fluids that are geometrically constrained to a small, typically sub-millimeter, scale.
Using available toolset we are able to define extreme topologies and etch multi-depth channels in the same device to realise complex and advanced microfluidic structures.
Subsequent encapsulation is performed by means of glass –to-silicon or silicon-to-silicon wafer bonding, with double sided alignment capability.
Mir Enterprises has years of experience working on quantum dot devices spanning back a decade. Using the latest electron beam lithography and high quality thermal oxidation we have been leading the research in this frontier.
Mir Enterprises uses highly developed recipes of thin films to realise complex and integrated sensors. These films exhibit specific mechanical and chemical properties. Examples of such materials include: low stress LPCVD layers for ultra-thin membrane applications, tuneable PECVD layers for stress compensation or passivation against harsh environments, rutile or anatase sputtered metal oxides for a variety of applications and many more.