Mir Enterprises will be attending SEMICON Europa 2017, MUNICH — 17 October 2017
21st July 2017
Next generation of MEMS angular rate sensors
10th December 2019

Volume and production grade lithography and etching capability, down to 0.5um MFS and better than 100nm overlay

Making use of production grade and volume compatible tools such as the ASML 5500B i-line stepper lithography (with double sided 3D alignment capability) together with deposition/growth and etching clusters (wet and dry), for both 6inch and 8inch platforms, Mir Enterprises offers volume and cost effective fabrication with excellent yield. To enquire about these services please contact us and we’ll be glad to help.