Services
Below is a list of some of the services we offer. For our complete range please give us a call and one of our process integration engineers will be glad to help you.
Lithography
- Contact printing, single and double sided. min resolution of 2um
- Stepper Lithography, min resolution 480nm
- Direct write (E-Beam), min resolution down to 20nm
- Robotic wafer handling for optimum yield
- Spray coating technology for high topology surfaces
He-ion FIB sub nano imaging and milling
- Carl Zeiss NanoVision N40 below 0.9nm resolution
Nano Imprinting Technology
- Nano stamping and patterning down to 50nm resolution
Dry etching
- RIE
- DRIE, Advanced Silicon Etch using Bosch process
- Ion Beam Milling
Implantation
- upto 750keV with an extensive range of targets Growth, diffusion and wet processing
- Extensive range of furnaces from standard anneal to high quality gate oxides
- Full wet processing line
Deposition
- Sputtering and Electron beam evaporation with various targets
- PECVD Silicon nitride, silicon oxide and TEOS
- Low Pressure CVD silicon nitride and poly/amorphous silicon reactors
Metrology and Characterisation
- FESEM down to 1nm resolution
- SEM with X-ray fluorescence analysis
- SEM with high resolution 2D and 3D X-ray imaging of internal structures of samples
- SEM with fluorescence imaging spectrometer for sub-100nm spatial resolution imaging
- AFM and high resolution cryogenic Scanning Probe Microscope (SPM) with TERS
- Ellipsometer, profilometer, thin film, stress measurement tools
- Microscope for wide field and confocal imaging with 405nm laser for writing
- BioMEMS microscope with up to 150x objectives
- Spectral analysis microscope with fibre coupling unit connecting to a photospectrometer
Measurement tools
- Stress, dektak and four point probe measurement tools
- 3D modelling and Rapid Prototyping
- Design, modelling of 3D structures and prototyping using resin down to 0.1mm resolutions
Dicing and bonding
- Wafer sawing/dicing, gold wire bonding and packaging
Miscellaneous
- Electrophoretic coating for extreme MEMS technology